Hexamethyldisilane

Hexamethyldisilane has a wide range of applications across various fields:

• Photolithography: It is used as a surface treatment agent for silicon wafers to improve adhesion during photoresist application.
• Gas Chromatography: Hexamethyldisilane serves as a silylation reagent to enhance the volatility of analytes, facilitating their detection.
• Chemical Vapor Deposition: It acts as a precursor for depositing silicon-containing thin films in semiconductor manufacturing and material science.
• Surface Modification: It is employed to modify surfaces of metals and ceramics through silane coupling reactions, enhancing their hydrophobic properties.

Please email your required order quantity and detailed technical specifications to sales@.
Our sales team will promptly prepare an accurate quotation for your bulk order and provide a comprehensive pricing proposal.

All products are for research and development use only, not for any other uses, and must be handled by technically-qualified persons.

These products are explicitly not intended to be used in foods and/or cosmetics and/or drugs (human and veterinary) and/or consumer products and/or biocides and/or pesticides of any kind unless explicitly stated otherwise.

Products are not sold to individuals. We do not ship to residential addresses. Consumer orders will be cancelled without notice.

New customers undergo an internal onboarding process. As part of this process, new customers may be asked for more information. Additional restrictions may apply.